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[Qwen] avoid creating attention masks when there is no padding #12987
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The docs for this PR live here. All of your documentation changes will be reflected on that endpoint. The docs are available until 30 days after the last update. |
sayakpaul
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Thanks!
Could you update with the following things?
- Shed light into what caused the speed regression
- Add a test with masks in the compilation tests here
- Do a before and after comparison in the outputs with the PR
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will do! |
src/diffusers/pipelines/qwenimage/pipeline_qwenimage_img2img.py
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| with torch.no_grad(): | ||
| output_no_mask = compiled_model(**inputs_no_mask) |
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Does it lead to graph breaks? If not, then we should add additional contexts:
diffusers/tests/models/test_modeling_common.py
Line 2145 in 3996788
| torch._dynamo.config.patch(error_on_recompile=True), |
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does this PR lack a merge, or is the amount of code changes intentional and really part of this PR only? (+318 - 170) avoiding masks if they're not necessary has been one line before |
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@dxqb i intially mis-calculated and was adding support for the pipeline to be compiled, i will revert and simplify |
thanks!
Therefore, I'd suggest to
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Here is a benchmark of the impact of using a mask unnecessarily (second graph): #12870 (comment) |
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thanks @dxqb please check now |
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I tested this #12987 on L20, and there was an 11% performance improvement in my test. |
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And do you find that to resolve your concerns? |
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I think this has solved my problem. Based on this PR, the performance in my test cases has been working as expected. |

What does this PR do?
This pull request sets all ones masks to None.
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